This product is a core scientific research equipment developed for extreme ultraviolet (EUV) lithography technology. It adopts a dual-lens group projection optical architecture, adapts to the optical transmission characteristics of the extreme ultraviolet band, and enables high-precision pattern projection and exposure imaging.
This product is equipped with a highly stable vacuum optical cavity, which effectively reduces the attenuation loss of EUV light in the atmosphere. Combined with a precision displacement and alignment system, it can accurately control the projection magnification and exposure accuracy. It is suitable for cutting-edge scientific research fields such as micro-nano processing, R&D of semiconductor lithography processes, EUV optical components, and performance verification of photomasks and photoresists, providing a reliable experimental platform for basic research and process optimization of EUV lithography technology.