This product is a specialized high-resolution microscopic imaging instrument designed for the extreme ultraviolet (EUV) band. It integrates an EUV illumination system, a high-sensitivity imaging detection module, and an ultra-high vacuum optical cavity, breaking through the imaging limitations of traditional optical microscopy in the EUV band.
This product offers nanometer-scale spatial resolution, enabling direct imaging and analysis of micro-nano structures, surface topography of EUV optical components, and micro-region characteristics of semiconductor materials. It also supports in-situ dynamic observation, making it suitable for scientific research scenarios such as materials science, micro-nano optics, semiconductor device characterization, EUV optical components, and performance verification of mask blanks and mask pattern plates. It provides a high-resolution, high-reliability imaging solution for the study of microscopic morphology and properties in the extreme ultraviolet band.