This product is a gas control component designed for ultra-high vacuum and ultra-clean experimental environments. It integrates high-precision flow valves, a purity filtration module and a pressure monitoring unit to realize ultra-clean gas delivery, precise flow regulation and stable pressure control. It is free of particulate contamination and secondary outgassing, making it suitable for scenarios with stringent gas cleanliness requirements, such as EUV/soft X-ray optical systems, vacuum coating and semiconductor manufacturing processes.
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